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Theoretical calculation boosting the chemical vapor deposition growth of graphene film

Cheng, T; Sun, LZ; Liu, ZR; Ding, F; Liu, ZF

Liu, ZF (corresponding author), Peking Univ, Coll Chem & Mol Engn, Beijing Natl Lab Mol Sci,Ctr Nanochem, Acad Adv Interdisciplinary Studies,Beijing Sci &, Beijing 100871, Peoples R China.; Liu, ZF (corresponding author), Beijing Graphene Inst BGI, Beijing 100095, Peoples R China.; Ding, F (corresponding author), Inst Basic Sci, CtreMultidimens Carbon Mat, Ulsan, South Korea.; Ding, F (corresponding author), Ulsan Natl Inst Sci & Technol, Sch Mat Sci & Engn, Ulsan, South Korea.

APL MATERIALS, 2021; 9 (6):

Abstract

Chemical vapor deposition (CVD) is a promising method for the mass production of high-quality graphene films, and great progress has been made over th......

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