Efficient Ohmic contacts and built-in atomic sublayer protection in MoSi2N4 and WSi2N4 monolayers
Wang, QQ; Cao, LM; Liang, SJ; Wu, WK; Wang, GZ; Lee, CH; Ong, WL; Yang, HY; Ang, LK; Yang, SYA; Ang, YS
Ang, LK; Yang, SYA; Ang, YS (corresponding author), Singapore Univ Technol & Design, Sci Math & Technol, Singapore, Singapore.; Yang, SYA (corresponding author), Singapore Univ Technol & Design, Res Lab Quantum Mat, Singapore, Singapore.; Cao, LM (corresponding author), Hengyang Normal Univ, Coll Phys & Elect Engn, Hengyang, Peoples R China.
NPJ 2D MATERIALS AND APPLICATIONS, 2021; 5 (1):