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Self-Aligned Block and Fully Self-Aligned Via for iN5 Metal 2 Self-Aligned Quadruple Patterning

Vincent, B; Franke, JH; Juncker, A; Lazzarino, F; Murdoch, G; Halder, S; Ervin, J

Vincent, B (reprint author), Coventor, 3 Ave Quebec ZI Courtaboeuf, F-91140 Villebon Sur Yvette, France.

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IX, 2018; 10583 ():

Abstract

This paper assesses Self-Aligned Block (SAB) and Fully Self-Aligned Via (FSAV) approaches to patterning using a iN5 (imec node 5 nm) vehicle and Metal......

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