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The formation mechanism of (001) preferred orientation for anatase TiO2 film prepared by DC pulsed magnetron sputtering

Zhang, Y; Liu, ZH; Zhang, X; Wang, QZ; Wang, Q; Wang, HL; Jiang, WW; Liu, SM; Liu, CQ; Wang, N; Cui, YN; Ma, YP; Ding, WY; Liu, JD

Ding, WY (corresponding author), Dalian Jiaotong Univ, Coll Mat Sci & Engn, 794 Huanghe Rd, Dalian 116028, Liaoning, Peoples R China.; Liu, JD (corresponding author), Jilin Inst Chem Technol, Coll Mech & Elect Engn, 45 Chengde St, Jilin 132022, Jilin, Peoples R China.

VACUUM, 2021; 190 ():

Abstract

TiO2 films were deposited by DC pulsed magnetron sputtering with different sputtering power density (SPD). Then, as-deposited TiO2 films were annealed......

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