Dynamic Down-Selection of Measurement Markers for Optimized Robust Control of Overlay Errors in Photolithography Processes-MedSci.cn - 梅斯（MedSci）

Dynamic Down-Selection of Measurement Markers for Optimized Robust Control of Overlay Errors in Photolithography Processes

Zhang, HD; Feng, TH; Djurdjanovic, D

Djurdjanovic, D (通讯作者)，Univ Texas Austin, Walker Dept Mech Engn, Austin, TX 78712 USA.

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2022; 35 (2): 241

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