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Estimated mask contours: potential applications

Gookassian, J; Rojas, C

Gookassian, J (reprint author), Synopsys Inc, Mountain View, CA 94043 USA.

PHOTOMASK TECHNOLOGY 2017, 2017; 10451 ( ):

Abstract

Mask writers have evolved significantly in the last decade, and many modern ones include some level of process error correction. However, the feature ......

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