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Composition and Morphology of a Si(111) Surface with a SiO2 Surface Film of Different Thicknesses

Umirzakov, BE; Donaev, SB; Yorkulov, RM; Ashurov, RK; Rotshtein, VM

Donaev, SB (通讯作者),Tashkent State Tech Univ, Tashkent 100095, Uzbekistan.

SEMICONDUCTORS, 2022; 56 (4): 266

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