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Haze and pellicle material selection for haze free

Cho, SJ; Lee, BP; Kim, JH; Song, WK; Choi, HK; Lee, GS; Kim, SW; Kim, JK

Cho, SJ (reprint author), Fine Semitech Corp, 14-18 Gajangsaneopdong Ro, Osan Si 18103, Gyeonggi Do, South Korea.

35TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE (EMLC 2019), 2019; 11177 ():

Abstract

The problem of haze occurrence in photolithography is one of the most important problems in the lithography industry. Understanding the conditions and......

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