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Nanocube Imprint Lithography

Agrawal, H; Garnett, EC

Garnett, EC (corresponding author), AMOLF, Ctr Nanophoton, NL-1098 XG Amsterdam, Netherlands.

ACS NANO, 2020; 14 (9): 11009

Abstract

In recent years, imprint lithography has emerged as a promising patterning technique capable of high-speed and volume production. In this work, we rep......

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