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Surface properties of Al-doped ZnO thin film before and after CF4/Ar plasma etching

Joo, YH; Kim, GH; Um, DS; Kim, CI

Kim, CI (通讯作者),Chung Ang Univ, Sch Elect & Elect Engn, Seoul 06974, South Korea.;Um, DS (通讯作者),Sejong Univ, Dept Elect Engn, Seoul 05006, South Korea.

PLASMA SCIENCE & TECHNOLOGY, 2022; 24 (7):

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