Stepping electron-beam lithography for Y-gate in high electron mobility transistors fabrication-MedSci.cn - 梅斯（MedSci）

Stepping electron-beam lithography for Y-gate in high electron mobility transistors fabrication

Zhang, P; Chen, JW; Zhang, T; Wang, MF; Yang, M; Ma, XH

Zhang, P (通讯作者)，Xidian Univ, Xian, Peoples R China.

MICROELECTRONIC ENGINEERING, 2022; 258 ():

科室
- - 订阅+
  - 更多科室
工具
服务