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TiO2-SiO2 Self-Standing Materials bearing Hierarchical Porosity: MUB-200(x) Series toward 3D-Efficient VOC Photoabatement Properties

Layan, E; Gupta, J; Ly, I; Nallet, F; Bentaleb, A; Laurichesse, E; Vallée, R; Blin, JL; Lebeu, B; Louërat, F; Le Bechec, M; Moonen, P; Toupance, T; Pigot, T; Backov, R

Backov, R (通讯作者),Univ Bordeaux, CRPP UMR CNRS 5031, F-33600 Pessac, France.;Pigot, T (通讯作者),Univ Pau & Pays Adour, E2S UPPA, CNRS, IMT Mines Ales,IPREM, F-64000 Pau, France.

LANGMUIR, 2023; 39 (11): 3871

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