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Topographically selective deposition

Chaker, A; Vallee, C; Pesce, V; Belahcen, S; Vallat, R; Gassilloud, R; Posseme, N; Bonvalot, M; Bsiesy, A

Bsiesy, A (reprint author), Univ Grenoble Alpes, CNRS, LTM, F-38000 Grenoble, France.

APPLIED PHYSICS LETTERS, 2019; 114 (4):

Abstract

In this paper, we present a topographically Selective Deposition process which allows the vertical only coating of three-dimensional (3D) nano-structu......

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