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投稿信息
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中国人发表比例
2023年中国人文章占该期刊总数量暂无数据 (2022年为100.00%)
自引率
21.2 %
年文章数
3050
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期刊简介
稿件收录要求
稿件收录要求
Subject coverage. Plasma Sources Science and Technology reports on non-fusion plasma sources which operate at all ranges of pressure and density including neutral and non-neutral plasma sources; positive and negative ion sources; free radical sources; microwave, RF, direct current, laser and electron beam excited sources; resonant sources; plasmas for etching, deposition, polymerization, sintering; plasma sources for accelerators; lighting applications; plasma sources for medical physics; plasma sources for lasers; other applications, e.g. spacecraft thrusters, industrial arc melting; plasmas as sources of UV and x-ray radiation; plasma source design, monitoring and control; source stability and reproducibility. Low-pressure plasma sources: distribution functions; excitation-radiation equilibria; vibrational excitation; mass, momentum and energy transport; ion implantation. Low-to-medium pressure plasma sources: plasma surface interactions; high pressure sources, thermal plasmas; plasma diagnostic techniques; plasma and plasma source modelling.
