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Machine Learning Models for Edge Placement Error Based Etch Bias

Meng, Y; Kim, YC; Guo, SJ; Shu, ZL; Zhang, YC; Liu, QW

Meng, Y (corresponding author), Semicond Mfg Int Corp, Res & Dev Dept, Shanghai 201203, Peoples R China.

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2021; 34 (1): 42

Abstract

As the technology node in semiconductor manufacturing continuously shrinks its feature size and boosts the transistor density, etch bias is facing gre......

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