期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2021; 34 (2)
In LED semiconductor manufacturing, it is important to evaluate the wafer reflectance in order to validate the quality of wafers. In this work, a lear......
期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2021; 34 (2)
Fault prognosis under multiple fault modes is critical to predictive maintenance of complex tools in semiconductor manufacturing. However, the inheren......
期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2021; 34 (2)
Aluminum nitride (AlN) is a semiconductor material with the wide band gap. The requirement of the substrate for the semiconductor device is no surface......
期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2021; 34 (3)
Model-based control methods do not produce satisfactory control results with the batch process control of Czochralski (CZ) silicon monocrystalline wit......
期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2021; 34 (3)
Defective pixels always exist in an uncooled infrared focal plane array (IR FPA), and have a significant impact on image quality. To fundamentally red......
期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2021; 34 (3)
The growth process of Czochralski (Cz) silicon single crystal is a dynamic time-varying system with nonlinearity, strong coupling, large hysteresis, a......
期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2021; 34 (1)
A new control strategy combing the Finite Element Method (FEM) with the control method is proposed to study the control of crystal growth process in t......
期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2021; 34 (1)
Feature design and selection is challenging because of huge data volume and high-mix production systems. Most engineers still rely on human experts to......
期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2021; 34 (1)
In the process of multi-crystalline silicon etched by the Metal Assisted Chemical Etching (MACE) method, due to its too small and uneven microstructur......
期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2021; 34 (1)
As the technology node in semiconductor manufacturing continuously shrinks its feature size and boosts the transistor density, etch bias is facing gre......
期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2020; 33 (4)
Defect pattern recognition (DPR) of wafer maps is critical for determining the root cause of production defects, which can provide insights for the yi......
期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2020; 33 (4)
Wafer map analysis is one of the most critical steps for monitoring wafer quality and tracking failures in the semiconductor manufacturing process. De......
期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2020; 33 (4)
GaN power ICs on engineered substrates of Qromis substrate technology (QST) are promising for future power applications, thanks to the reduced parasit......
期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2020; 33 (1)
This study used reduced graphene oxide (rGO) applied to a platinum (Pt) counter electrode to improve light conversion efficiency. The study also used ......
期刊： IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2020; 33 (1)
Heat effects on femtosecond laser annealing to crystallize doped amorphous Si films are studied. The structural, optical and electronic properties of ......
