Sub-10 nm Feature Sizes of Disordered Polystyrene-block-poly(methyl methacrylate) Copolymer Films Achieved by Ionic Liquid Additives with Selectively Distributed Charge Interactions-MedSci.cn

Sub-10 nm Feature Sizes of Disordered Polystyrene-block-poly(methyl methacrylate) Copolymer Films Achieved by Ionic Liquid Additives with Selectively Distributed Charge Interactions

Chen, SJ; Wu, GP; Wang, XL; Chen, XX; Nealey, P

Chen, SJ (corresponding author), Nanjing Tech Univ, Coll Mat Sci & Engn, Nanjing 210009, Jiangsu, Peoples R China.; Wang, XL (corresponding author), Nanjing Univ, Dept Polymer Sci & Engn, Sch Chem & Chem Engn, Minist Educ,Key Lab High Performance Polymer Mat, Nanjing 210093, Peoples R China.

Abstract

Weak segregation of polystyrene-block-poly(methyl methacrylate) block copolymers (PS-b-PMMA BCPs) limits their utility for sub-10 nm lithography. Such......

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Sub-10 nm Feature Sizes of Disordered Polystyrene-block-poly(methyl methacrylate) Copolymer Films Achieved by Ionic Liquid Additives with Selectively Distributed Charge Interactions

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