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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

出版年份:1991 年文章数:5080 投稿命中率: 开通期刊会员,数据随心看

出版周期:Bimonthly 自引率:8.0% 审稿周期: 开通期刊会员,数据随心看

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投稿信息
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中国人发表比例
2023年中国人文章占该期刊总数量暂无数据 (2022年为100.00%)
自引率
8.0 %
年文章数
5080
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期刊简介
稿件收录要求
The Journal of Vacuum Science and Technology B is devoted to reports of original research, review articles, and Critical Review articles. The JVST B has been established to provide a vehicle for the publication of research dealing with microelectronics and nanometer structures. The emphasis will be on processing, measurement and phenomena, and will include vacuum processing, plasma processing, materials and structural characterization, microlithography, and the physics and chemistry of submicron and nanometer structures and devices. The journal also publishes papers from conferences and symposia that are sponsored by the AVS and its Divisions. JVST B is published six times annually (Jan/Feb, Mar/Apr, May/Jun, Jul/Aug, Sep/Oct, Nov/Dec).
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